Name: Simox (Materials, Circuits and Devices) (en Inglés)
Price: 182200.00 CLP
Availability: InStock
Author: Katsutoshi Izumi; Peter L.F. Hemment; Atsushi Ogura; Harold J. Hovel; Devendra K. Sadana
ISBN: 9780863413346

portada Simox (Materials, Circuits and Devices) (en Inglés)

Formato

Libro Físico

Editorial

The Institution Of Engineering And Technology

Autor

Katsutoshi Izumi; Peter L.F. Hemment; Atsushi Ogura; Harold J. Hovel; Devendra K. Sadana

Año

2004

Idioma

Inglés

N° páginas

159

Encuadernación

Tapa Dura

ISBN13

9780863413346

Categorías

Ingeniería eléctrica

Simox (Materials, Circuits and Devices) (en Inglés)

Katsutoshi Izumi; Peter L.f. Hemment; Atsushi Ogura; Harold J. Hovel; Devendra K. Sadana (Autor) · The Institution Of Engineering And Technology · Tapa Dura

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Origen: Estados Unidos (Costos de importación incluídos en el precio)

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Reseña del libro "Simox (Materials, Circuits and Devices) (en Inglés)"

SIMOX explores Separation-by-IMplanted-OXygen technology, a method of fabricating silicon-on-insulator structures and substrates by implanting high doses of oxygen and high temperature annealing. The content includes an historical perspective on the development of SIMOX technology and a discussion of the theoretical background to the underlying formation of SIMOX buried oxide. It also describes the fabrication processes and material characterisation, and covers crucial advancements in evolution of manufacturability from experimental research stage to production-worthy processes proven to support advanced SOI products. In addition to the topics directly pertaining to SIMOX, the book offers wealth of information on ion implantation, thermal processing in extreme conditions, material defects, characterisation techniques, applications and future technology trends. The book consists of sequence of chapters, each written by a key contributor to the field and represents the first effort to compile broad knowledge of this still evolving technology. It provides the reader with a basic understanding of SIMOX technology and a background for further investigations and applications.