Name: Deposition and Applications of Low-Temperature AlN Thin Films (en Inglés)
SKU: 66725695
Price: 101840.00 CLP
Availability: InStock
Author: Liu, Sanjie; Zheng, Xinhe
ISBN: 9786209412660

portada Deposition and Applications of Low-Temperature AlN Thin Films (en Inglés)

Deposition and Applications of Low-Temperature AlN Thin Films (en Inglés)

Formato

Libro Físico

Editorial

Scholars' Press

Autor

Liu, Sanjie; Zheng, Xinhe

Idioma

Inglés

N° páginas

188

Encuadernación

Tapa Blanda

Dimensiones

22.9x15.2x1.1 cm

ISBN13

9786209412660

Deposition and Applications of Low-Temperature AlN Thin Films (en Inglés)

Liu, Sanjie; Zheng, Xinhe (Autor) · Scholars' Press · Tapa Blanda

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Reseña del libro "Deposition and Applications of Low-Temperature AlN Thin Films (en Inglés)"

This book is a specialized monograph that explores the deposition and application of high-quality aluminum nitride (AlN) thin films grown at low temperatures using Plasma-Enhanced Atomic Layer Deposition (PEALD). It details how PEALD overcomes the limitations of traditional high-temperature methods, enabling the growth of crystalline AlN with sharp interfaces and excellent uniformity on temperature-sensitive substrates like silicon and GaAs. The book systematically presents the authors' research, covering process optimization, interface engineering, and the fundamental relationship between deposition parameters and film properties. It further highlights the functional application of these films in cutting-edge fields, demonstrating their role as passivation and interface modification layers to significantly enhance the performance of nano-photonic emitter arrays and quantum dot-sensitized solar cells. Overall, it provides a comprehensive guide from materials science fundamentals to advanced optoelectronic and energy device integration.